UV-LIGA: From Development to Commercialization
نویسندگان
چکیده
منابع مشابه
UV-LIGA: From Development to Commercialization
A major breakthrough in UV-LIGA (Lithographie, Galvanoformung and Abformung) started with the use of epoxy-based EPON SU-8 photoresist in the mid-1990s. Using this photoresist has enabled the fabrication of tall and high aspect ratio structures without the use of a very expensive synchrotron source needed to expose the photoresist layer in X-ray LIGA. SU-8 photoresist appeared to be well-suited...
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ژورنال
عنوان ژورنال: Micromachines
سال: 2014
ISSN: 2072-666X
DOI: 10.3390/mi5030486